Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | RUN TO RUN CONTROL | authKW | 1629104 | 7% | 75% | 57 |
| 2 | VIRTUAL METROLOGY | authKW | 1167060 | 4% | 88% | 35 |
| 3 | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | journal | 972722 | 24% | 13% | 202 |
| 4 | VIRTUAL METROLOGY VM | authKW | 533517 | 2% | 100% | 14 |
| 5 | AUTOMATIC VIRTUAL METROLOGY AVM | authKW | 457300 | 1% | 100% | 12 |
| 6 | RUN TO RUN R2R CONTROL | authKW | 381084 | 1% | 100% | 10 |
| 7 | ADVANCED PROCESS CONTROL APC | authKW | 342969 | 1% | 75% | 12 |
| 8 | RUN TO RUN PROCESS CONTROL | authKW | 304867 | 1% | 100% | 8 |
| 9 | EWMA CONTROLLER | authKW | 266759 | 1% | 100% | 7 |
| 10 | PHOTORESIST PROCESSING | authKW | 207476 | 1% | 78% | 7 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Engineering, Manufacturing | 29376 | 33% | 0% | 272 |
| 2 | Engineering, Electrical & Electronic | 5055 | 46% | 0% | 382 |
| 3 | Physics, Applied | 4759 | 49% | 0% | 404 |
| 4 | Engineering, Industrial | 2604 | 10% | 0% | 82 |
| 5 | Physics, Condensed Matter | 2528 | 30% | 0% | 247 |
| 6 | Operations Research & Management Science | 1955 | 11% | 0% | 94 |
| 7 | Automation & Control Systems | 1928 | 10% | 0% | 86 |
| 8 | Materials Science, Coatings & Films | 1242 | 9% | 0% | 76 |
| 9 | Nanoscience & Nanotechnology | 468 | 9% | 0% | 75 |
| 10 | Computer Science, Artificial Intelligence | 327 | 6% | 0% | 48 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | ENGN ADV ELECT MAT PROC | 114325 | 0% | 100% | 3 |
| 2 | MICROMECHATRON | 105524 | 1% | 46% | 6 |
| 3 | MFG INFORMAT SYST | 79116 | 2% | 12% | 18 |
| 4 | AUTOMATED PRECIS MFG | 76217 | 0% | 100% | 2 |
| 5 | LARGE SCALE INTEGRAT | 76217 | 0% | 100% | 2 |
| 6 | ADV MICROELECT TECHNOL | 50810 | 0% | 67% | 2 |
| 7 | CIMOS | 50810 | 0% | 67% | 2 |
| 8 | ABELL CHAIR ENGN | 38108 | 0% | 100% | 1 |
| 9 | ADV MAT SEMICOND DEVICE TECHNOLL | 38108 | 0% | 100% | 1 |
| 10 | ADV PROC EQUIPMENT | 38108 | 0% | 100% | 1 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 972722 | 24% | 13% | 202 |
| 2 | JOURNAL OF PROCESS CONTROL | 15426 | 4% | 1% | 29 |
| 3 | SOLID STATE TECHNOLOGY | 9878 | 3% | 1% | 22 |
| 4 | MICRO | 7783 | 1% | 3% | 6 |
| 5 | IIE TRANSACTIONS | 6526 | 3% | 1% | 21 |
| 6 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 5357 | 5% | 0% | 45 |
| 7 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 4743 | 6% | 0% | 46 |
| 8 | TECHNOMETRICS | 3242 | 1% | 1% | 11 |
| 9 | JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 2501 | 0% | 2% | 4 |
| 10 | INTERNATIONAL JOURNAL OF PRODUCTION RESEARCH | 2284 | 3% | 0% | 23 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |