Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
| 13 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 136516 |
| 1594 | 2 | POLYCRYSTALLINE SILICON//POLY SI//THIN FILM TRANSISTORS | 7411 |
| 23596 | 1 | RAPID THERMAL PROCESSING//RAPID THERMAL PROCESSING RTP//SILICON NANOELECT | 364 |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | RAPID THERMAL PROCESSING | authKW | 682371 | 11% | 20% | 40 |
| 2 | RAPID THERMAL PROCESSING RTP | authKW | 666006 | 5% | 38% | 20 |
| 3 | SILICON NANOELECT | address | 307845 | 2% | 44% | 8 |
| 4 | THERMAL BUDGET CONTROL | authKW | 259752 | 1% | 100% | 3 |
| 5 | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | journal | 208159 | 17% | 4% | 62 |
| 6 | SIMS DEPTH PROFILE | authKW | 196776 | 1% | 45% | 5 |
| 7 | RAPID ISOTHERMAL PROCESSING RIP | authKW | 194812 | 1% | 75% | 3 |
| 8 | RAPID PHOTOTHERMAL PROCESSING | authKW | 194812 | 1% | 75% | 3 |
| 9 | WAFER TEMPERATURE UNIFORMITY | authKW | 194812 | 1% | 75% | 3 |
| 10 | 12 IN SILICON WAFER | authKW | 173168 | 1% | 100% | 2 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Engineering, Manufacturing | 4363 | 19% | 0% | 70 |
| 2 | Physics, Applied | 2872 | 57% | 0% | 206 |
| 3 | Engineering, Electrical & Electronic | 1546 | 39% | 0% | 142 |
| 4 | Physics, Condensed Matter | 1075 | 29% | 0% | 107 |
| 5 | Materials Science, Coatings & Films | 797 | 11% | 0% | 40 |
| 6 | Materials Science, Multidisciplinary | 177 | 18% | 0% | 67 |
| 7 | Electrochemistry | 164 | 6% | 0% | 23 |
| 8 | Thermodynamics | 135 | 5% | 0% | 20 |
| 9 | Automation & Control Systems | 134 | 4% | 0% | 16 |
| 10 | Engineering, Mechanical | 57 | 5% | 0% | 18 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | SILICON NANOELECT | 307845 | 2% | 44% | 8 |
| 2 | OBERFLACHEN ICHTENANALYT | 173168 | 1% | 100% | 2 |
| 3 | RTP PROD BUSINESS UNIT | 115444 | 1% | 67% | 2 |
| 4 | CAVEVDISH MICROELECT | 86584 | 0% | 100% | 1 |
| 5 | CHEM SYST ENGN ADV MAT | 86584 | 0% | 100% | 1 |
| 6 | GAS CONTAMINAT CONTROL PROD | 86584 | 0% | 100% | 1 |
| 7 | METROL EQUIPMENT DEV | 86584 | 0% | 100% | 1 |
| 8 | MICROELECT GAS | 86584 | 0% | 100% | 1 |
| 9 | NEXREAL INC | 86584 | 0% | 100% | 1 |
| 10 | OLL MECH AEROSP ENGN | 86584 | 0% | 100% | 1 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 208159 | 17% | 4% | 62 |
| 2 | SOLID STATE TECHNOLOGY | 9101 | 4% | 1% | 14 |
| 3 | IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY PART A | 2002 | 1% | 1% | 3 |
| 4 | JOURNAL OF ELECTRONIC MATERIALS | 1632 | 4% | 0% | 14 |
| 5 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1461 | 6% | 0% | 23 |
| 6 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 535 | 3% | 0% | 10 |
| 7 | MICRO | 490 | 0% | 1% | 1 |
| 8 | MICROSCALE THERMOPHYSICAL ENGINEERING | 429 | 0% | 0% | 1 |
| 9 | JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS | 399 | 1% | 0% | 5 |
| 10 | CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES | 395 | 0% | 0% | 1 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |