EF2270 Teknisk plasmafysik 6,0 hp

Applied Plasma Physics

Plasma, the fourth state of matter, makes up 99% of the visible universe. On Earth the diverse industries associated with plasma technology has been estimated to account for about 20% of the GNP. Present applications are found in practically every branch of modern industry, and range from fine structure etching and deposition in integrated circuit production to high power plasma torches. New developments in applications include atmospheric-pressure plasma processing, plasma addressing environmental problems, plasma medicine, and plasma nano- technology.

  • Utbildningsnivå

    Avancerad nivå
  • Huvudområde

    Teknisk fysik
  • Betygsskala

    A, B, C, D, E, FX, F


HT19 för programstuderande

HT18 för programstuderande


The goal of the course is to make the student familiar with a broad range of technical plasma devices, and able to analyze and describe their main plasma physical characteristics and principles of operation. After the course the student shall be able to:

  • Describe the plasma physical processes, and characterizing parameters, that are listed in the course content.
  • Explain the functioning, with focus on the dominating plasma physical processes, of the six discharge types that are listed in the course content.
  • Describe the technical applications of plasma processing that are listed in the course content, and explain how the discharge types’ characteristic parameters are related to the desired use of the devices.

For the highest grade the student shall be able to apply the knowledge also to analyze and characterize other discharge types than those treated in the course.

Kursens huvudsakliga innehåll

Instead of treating the whole, very wide field, of industrial plasma discharge types, the course focuses on six discharge types that have been selected so that they together exemplify most of the knowledge basis in applied plasma physics. For each discharge type the focus is on the plasma processes that determine its characteristics, and one or two examples of industrial applications are treated.

  • Plasma physical processes: electron influx from surfaces by ion impact, thermal emission, field emission, cathode spots and corona emission. The balance of electron energy, both in ac and dc discharges. Plasma gain by ionization, and plasma loss by diffusion, recombination, and current losses. The self-bias process. Electron avalanches and streamers.
  • Characterizing parameters: collisionality, degree of ionization, degree of magnetization (for ions and for electrons). Scale lengths: gyro radii, mean free paths for elastic collisions and for ionization, and sheath thicknesses. The Hall, Pedersen, and parallel conductivities.
  • Discharge types: DC glow discharges, arc discharges, barrier discharges, corona discharges, sputtering magnetrons, and RF discharges.
  • Technical applications: Plasma etching and deposition in the microelectronics industry. Ion implantation. Medical sterilization. Electrostatic dust collectors. Plasma waste treatment. Plasma spray deposition. Plasma rocket propulsion. Plasma-chemical ozone production.


EF2200 Plasma Physics or equivalent.

For single course students: documented proficiency in English B or equivalent.

Rekommenderade förkunskaper

Basic electromagnetic field theory.

For single course students: documented proficiency in English B or equivalent.


To be communicated at the course start.


  • TEN1 - Examination, 6,0, betygsskala: A, B, C, D, E, FX, F

Krav för slutbetyg

Written examination.

Ges av

EECS/Energi och elektroteknik


Svetlana Ratynskaia


Svetlana Ratynskaia <svetlana.ratynskaia@ee.kth.se>


Kursplan gäller från och med HT2010.
Examinationsinformation gäller från och med VT2019.