Publikationer av Jon Tomas Gudmundsson
Refereegranskade
Artiklar
[1]
M. Renner et al., "Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges," Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, vol. 41, no. 3, 2023.
[2]
M. Kateb, J. T. Gudmundsson och S. Ingvarsson, "Epitaxial growth and characterization of (001) [NiFe/M]20 (M = Cu, CuPt and Pt) superlattices," SURFACES AND INTERFACES, vol. 38, s. 102783, 2023.
[3]
D. Q. Wen et al., "Field reversal in low pressure, unmagnetized radio frequency capacitively coupled argon plasma discharges," Applied Physics Letters, vol. 123, no. 26, 2023.
[4]
S. S. Babu et al., "High power impulse magnetron sputtering of tungsten : a comparison of experimental and modelling results," Plasma sources science & technology, vol. 32, no. 3, s. 034003, 2023.
[5]
C. D. Arrowsmith et al., "Inductively-coupled plasma discharge for use in high-energy-density science experiments," Journal of Instrumentation, vol. 18, no. 4, 2023.
[6]
V. G. Antunes et al., "Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges," Plasma sources science & technology, vol. 32, no. 7, 2023.
[7]
J. Fischer et al., "Insights into the copper HiPIMS discharge : deposition rate and ionised flux fraction," Plasma sources science & technology, vol. 32, no. 12, 2023.
[8]
D. Q. Wen et al., "On the importance of excited state species in low pressure capacitively coupled plasma argon discharges," Plasma sources science & technology, vol. 32, no. 6, 2023.
[9]
H. Hajihoseini et al., "Target ion and neutral spread in high power impulse magnetron sputtering," Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, vol. 41, no. 1, 2023.
[10]
J. T. Gudmundsson, A. Anders och A. von Keudell, "Foundations of physical vapor deposition with plasma assistance," Plasma sources science & technology, vol. 31, no. 8, s. 083001, 2022.
[11]
M. Rudolph et al., "Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge," Journal of Physics D : Applied Physics, vol. 55, no. 1, 2022.
[12]
J. T. Gudmundsson et al., "Ionization region model of high power impulse magnetron sputtering of copper," Surface & Coatings Technology, vol. 442, 2022.
[13]
S. S. Babu et al., "Modeling of high power impulse magnetron sputtering discharges with tungsten target," Plasma sources science & technology, vol. 31, no. 6, s. 065009, 2022.
[14]
M. Rudolph et al., "On the population density of the argon excited levels in a high power impulse magnetron sputtering discharge," Physics of Plasmas, vol. 29, no. 2, s. 023506, 2022.
[15]
M. Rudolph et al., "Operating modes and target erosion in high power impulse magnetron sputtering," Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, vol. 40, no. 4, s. 043005, 2022.
[16]
D. -. Wen et al., "Particle-in-Cell Simulations With Fluid Metastable Atoms in Capacitive Argon Discharges : Electron Elastic Scattering and Plasma Density Profile Transition," IEEE Transactions on Plasma Science, vol. 50, no. 9, s. 2548-2557, 2022.
[17]
D.-Q. Wen et al., "Benchmarked and upgraded particle-in-cell simulations of a capacitive argon discharge at intermediate pressure : the role of metastable atoms," Plasma sources science & technology, vol. 30, no. 10, 2021.
[18]
A. Proto och J. T. Gudmundsson, "Electron power absorption in radio frequency driven capacitively coupled chlorine discharge," Plasma sources science & technology, vol. 30, no. 6, 2021.
[19]
C. D. Arrowsmith et al., "Generating ultradense pair beams using 400 GeV/c protons," Physical Review Research, vol. 3, no. 2, 2021.
[20]
N. Brenning et al., "HiPIMS optimization by using mixed high-power and low-power pulsing," Plasma sources science & technology, vol. 30, no. 1, 2021.
[21]
H. Eliasson et al., "Modeling of high power impulse magnetron sputtering discharges with graphite target," Plasma sources science & technology, vol. 30, no. 11, 2021.
[22]
M. Rudolph et al., "On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputtering," Journal of Applied Physics, vol. 129, no. 3, 2021.
[23]
M. Rudolph et al., "On the electron energy distribution function in the high power impulse magnetron sputtering discharge," Plasma sources science & technology, vol. 30, no. 4, 2021.
[24]
M. Kateb et al., "On the role of ion potential energy in low energy HiPIMS deposition : An atomistic simulation," Surface & Coatings Technology, vol. 426, 2021.
[25]
J. T. Gudmundsson et al., "Surface effects in a capacitive argon discharge in the intermediate pressure regime," Plasma sources science & technology, vol. 30, no. 12, 2021.
[26]
M. Kateb, J. T. Gudmundsson och S. Ingvarsson, "Tailoring interface alloying and magnetic properties in (111) Permalloy/ Pt multilayers," Journal of Magnetism and Magnetic Materials, vol. 538, 2021.
[27]
M. Merino et al., "Collisionless electron cooling in a plasma thruster plume : experimental validation of a kinetic model," Plasma sources science & technology, vol. 29, no. 3, 2020.
[28]
M. Kateb, J. T. Gudmundsson och S. Ingvarsson, "Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS : An atomistic simulation," Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, vol. 38, no. 4, 2020.
[29]
A. Proto och J. T. Gudmundsson, "Electron power absorption dynamics in a low pressure radio frequency driven capacitively coupled discharge in oxygen," Journal of Applied Physics, vol. 128, no. 11, 2020.
[30]
M. T. Sultan et al., "Obtaining SiGe nanocrystallites between crystalline TiO2 layers by HiPIMS without annealing," Applied Surface Science, vol. 511, 2020.
[31]
N. Brenning et al., "Optimization of HiPIMS discharges : The selection of pulse power, pulse length, gas pressure, and magnetic field strength," Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, vol. 38, no. 3, 2020.
[32]
M. Rudolph et al., "Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering," Plasma sources science & technology, vol. 29, no. 5, 2020.
[33]
J. T. Gudmundsson, "Physics and technology of magnetron sputtering discharges," Plasma sources science & technology, vol. 29, no. 11, 2020.
[34]
Y. Akrami et al., "Planck 2018 results : XI. Polarized dust foregrounds," Astronomy and Astrophysics, vol. 641, 2020.
[35]
H. Hajihoseini et al., "Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering," Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, vol. 38, no. 3, 2020.
[36]
M. T. Sultan et al., "Structural and photoluminescence study of TiO2 layer with self-assembled Si1-xGex nanoislands," Journal of Applied Physics, vol. 128, no. 8, 2020.
[37]
M. Slapanska et al., "Study of the transition from self-organised to homogeneous plasma distribution in chromium HiPIMS discharge," Journal of Physics D : Applied Physics, vol. 53, no. 15, 2020.
[38]
G. A. Skarphedinsson och J. T. Gudmundsson, "Tailored voltage waveforms applied to a capacitively coupled chlorine discharge," Plasma sources science & technology, vol. 29, no. 8, 2020.
[39]
D. A. Toneli et al., "A global model study of low pressure high density CF4 discharge," Plasma sources science & technology, vol. 28, no. 2, 2019.
[40]
M. Kateb, J. T. Gudmundsson och S. Ingvarsson, "Effect of atomic ordering on the magnetic anisotropy of single crystal Ni80Fe20," AIP Advances, vol. 9, no. 3, 2019.
[41]
M. T. Sultan et al., "Efficacy of annealing and fabrication parameters on photo-response of SiGe in TiO2 matrix," Nanotechnology, vol. 30, no. 36, 2019.
[42]
J. T. Gudmundsson och A. Proto, "Electron heating mode transitions in a low pressure capacitively coupled oxygen discharge," Plasma sources science & technology, vol. 28, no. 4, 2019.
[43]
M. T. Sultan et al., "Enhanced photoconductivity of SiGe nanocrystals in SiO2 driven by mild annealing," Applied Surface Science, vol. 469, s. 870-878, 2019.
[44]
M. T. Sultan et al., "Enhanced photoconductivity of embedded SiGe nanoparticles by hydrogenation," Applied Surface Science, vol. 479, s. 403-409, 2019.
[45]
M. T. Sultan et al., "Fabrication and characterization of Si1-xGex nanocrystals in as-grown and annealed structures : a comparative study," Beilstein Journal of Nanotechnology, vol. 10, s. 1873-1882, 2019.
[46]
H. Hajihoseini et al., "Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering," Beilstein Journal of Nanotechnology, vol. 10, s. 1914-1921, 2019.
[47]
M. Kateb et al., "Role of ionization fraction on the surface roughness, density, and interface mixing of the films deposited by thermal evaporation, dc magnetron sputtering, and HiPIMS : An atomistic simulation," Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, vol. 37, no. 3, 2019.
[48]
M. Kateb et al., "Comparison of magnetic and structural properties of permalloy Ni80Fe20 grown by dc and high power impulse magnetron sputtering," Journal of Physics D : Applied Physics, vol. 51, no. 28, 2018.
[49]
H. Hajihoseini et al., "Effect of substrate bias on properties of HiPIMS deposited vanadium nitride films," Thin Solid Films, vol. 663, s. 126-130, 2018.
[50]
D. O. Thorsteinsson och J. T. Gudmundsson, "Growth of HfN thin films by reactive high power impulse magnetron sputtering," AIP Advances, vol. 8, no. 3, 2018.
[51]
G. Giono et al., "Non-Maxwellian electron energy probability functions in the plume of a SPT-100 Hall thruster," Plasma sources science & technology, vol. 27, no. 1, 2018.
[52]
A. Butler et al., "On three different ways to quantify the degree of ionization in sputtering magnetrons," Plasma sources science & technology, vol. 27, no. 10, 2018.
[53]
A. Proto och J. T. Gudmundsson, "The Influence of Secondary Electron Emission and Electron Reflection on a Capacitively Coupled Oxygen Discharge," Atoms, vol. 6, no. 4, 2018.
[54]
J. T. Gudmundsson, D. I. Snorrason och H. Hannesdottir, "The frequency dependence of the discharge properties in a capacitively coupled oxygen discharge," Plasma sources science & technology, vol. 27, no. 2, 2018.
[55]
A. Proto och J. T. Gudmundsson, "The role of surface quenching of the singlet delta molecule in a capacitively coupled oxygen discharge," Plasma sources science & technology, vol. 27, no. 7, 2018.
[56]
D. Lundin et al., "A study of the oxygen dynamics in a reactive Ar/O high power impulse magnetron sputtering discharge using an ionization region model," Journal of Applied Physics, vol. 121, no. 17, 2017.
[57]
N. Brenning et al., "A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons," Plasma sources science & technology, vol. 26, no. 12, 2017.
[58]
J. T. Gudmundsson och A. Hecimovic, "Foundations of DC plasma sources," Plasma sources science & technology, vol. 26, no. 12, 2017.
[59]
J. T. Gudmundsson och D. I. Snorrason, "On electron heating in a low pressure capacitively coupled oxygen discharge," Journal of Applied Physics, vol. 122, no. 19, 2017.
[60]
H. Hannesdottir och J. T. Gudmundsson, "On singlet metastable states, ion flux and ion energy in single and dual frequency capacitively coupled oxygen discharges," Journal of Physics D : Applied Physics, vol. 50, no. 17, 2017.
[61]
C. Huo et al., "Particle-balance models for pulsed sputtering magnetrons," Journal of Physics D : Applied Physics, vol. 50, no. 35, 2017.
[62]
A. Hecimovic och J. T. Gudmundsson, "Preface to Special Topic : Reactive high power impulse magnetron sputtering," Journal of Applied Physics, vol. 121, no. 17, 2017.
[63]
H. Hajihoseini och J. T. Gudmundsson, "Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputtering," Journal of Physics D : Applied Physics, vol. 50, no. 50, 2017.
[64]
J. T. Gudmundsson et al., "An ionization region model of the reactive Ar/O-2 high power impulse magnetron sputtering discharge," Plasma sources science & technology, vol. 25, no. 6, 2016.
[65]
N. Brenning et al., "The role of Ohmic heating in dc magnetron sputtering," Plasma sources science & technology, vol. 25, no. 6, 2016.
[66]
J. T. Gudmundsson och H. Hannesdottir, "The role of the metastable O2(b) and energy-dependent secondary electron emission yields in capacitively coupled oxygen discharges," Plasma sources science & technology, vol. 25, no. 5, 2016.
[67]
D. A. Toneli et al., "A volume averaged global model study of the influence of the electron energy distribution and the wall material on an oxygen discharge," Journal of Physics D : Applied Physics, vol. 48, no. 49, 2015.
[68]
J. T. Gudmundsson et al., "Are the argon metastables important in high power impulse magnetron sputtering discharges?," Physics of Plasmas, vol. 22, no. 11, 2015.
[69]
S. Huang och J. T. Gudmundsson, "Dual frequency capacitively coupled chlorine discharge," Plasma sources science & technology, vol. 24, no. 1, 2015.
[70]
J. T. Gudmundsson, "On reactive high power impulse magnetron sputtering," Plasma Physics and Controlled Fusion, vol. 58, no. 1, 2015.
[71]
D. A. Toneli et al., "On the formation and annihilation of the singlet molecular metastables in an oxygen discharge," Journal of Physics D : Applied Physics, vol. 48, no. 32, 2015.
[72]
J. T. Gudmundsson och M. A. Lieberman, "On the role of metastables in capacitively coupled oxygen discharges," Plasma sources science & technology, vol. 24, no. 3, 2015.
[73]
J. T. Gudmundsson och B. Ventejou, "The pressure dependence of the discharge properties in a capacitively coupled oxygen discharge," Journal of Applied Physics, vol. 118, no. 15, 2015.
[74]
S. Huang och J. T. Gudmundsson, "A current driven capacitively coupled chlorine discharge," Plasma sources science & technology, vol. 23, no. 2, 2014.
[75]
S. Huang och J. T. Gudmundsson, "Ion Energy and Angular Distributions in a Dual-frequency Capacitively Coupled Chlorine Discharge," IEEE Transactions on Plasma Science, vol. 42, no. 10, s. 2854-2855, 2014.
[76]
C. Huo et al., "On the road to self-sputtering in high power impulse magnetron sputtering : particle balance and discharge characteristics," Plasma sources science & technology, vol. 23, no. 2, s. 025017, 2014.
[77]
J. T. Gudmundsson, E. Kawamura och M. A. Lieberman, "A benchmark study of a capacitively coupled oxygen discharge of the oopd1 particle-in-cell Monte Carlo code," Plasma sources science & technology, vol. 22, no. 3, 2013.
[78]
C. Huo et al., "On sheath energization and Ohmic heating in sputtering magnetrons," Plasma sources science & technology, vol. 22, no. 4, s. 045005, 2013.
[79]
B. Agnarsson et al., "Rutile TiO2 thin films grown by reactive high power impulse magnetron sputtering," Thin Solid Films, vol. 545, s. 445-450, 2013.
[80]
J. T. Gudmundsson et al., "High power impulse magnetron sputtering discharge," Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, vol. 30, no. 3, s. 030801, 2012.
[81]
F. Magnus et al., "Nucleation and resistivity of ultrathin TiN films grown by high power impulse magnetron sputtering," IEEE Electron Device Letters, vol. 33, no. 7, s. 1045-1047, 2012.
[82]
M. Raadu et al., "An ionization region model for high-power impulse magnetron sputtering discharges," Plasma sources science & technology, vol. 20, no. 6, s. 065007, 2011.
[83]
F. Magnus et al., "Current-voltage-time characteristics of the reactive Ar/N2 high power impulse magnetron sputtering discharge," Journal of Applied Physics, vol. 110, no. 8, 2011.
[84]
E. G. Thorsteinsson och J. T. Gudmundsson, "A global (volume averaged) model of a chlorine discharge," Plasma sources science & technology, vol. 19, no. 1, 2010.
[85]
M. Samuelsson et al., "On the film density using high power impulse magnetron sputtering," Surface & Coatings Technology, vol. 205, no. 2, s. 591-596, 2010.
[86]
J. T. Gudmundsson, "The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool," Vacuum, vol. 84, no. 12, s. 1360-1364, 2010.
[87]
E. G. Thorsteinsson och J. T. Gudmundsson, "A global (volume averaged) model of the nitrogen discharge : II. Pulsed Power Modulation," Plasma sources science & technology, vol. 18, no. 4, 2009.
[88]
E. G. Thorsteinsson och J. T. Gudmundsson, "A global (volume averaged) model of the nitrogen discharge: I. Steady State," Plasma sources science & technology, vol. 18, no. 4, 2009.
[89]
F. Magnus och J. T. Gudmundsson, "Digital Smoothing of the Langmuir Probe I-V Characteristic," Review of Scientific Instruments, vol. 79, no. 7, 2008.
[90]
J. S. Agustsson et al., "Growth, coalescence, and electrical resistivity of thin Pt films grown by dc magnetron sputtering on SiO2," Applied Surface Science, vol. 254, no. 22, s. 7356-7360, 2008.
[91]
U. B. Arnalds et al., "A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements," Review of Scientific Instruments, vol. 78, no. 10, s. 103901, 2007.
[92]
J. T. Gudmundsson och E. G. Thorsteinsson, "Oxygen discharges diluted with argon : dissociation processes," Plasma sources science & technology, vol. 16, no. 2, s. 399-412, 2007.
[93]
K. B. Gylfason et al., "In-situ resistivity measurements during growth of ultra-thin Cr_0.7Mo_0.3," Thin Solid Films, vol. 515, no. 2, s. 583-586, 2006.
[94]
U. Helmersson et al., "Ionized Physical Vapor Deposition (IPVD): A Review of Technology and Applications," Thin Solid Films, vol. 513, s. 1-24, 2006.
[95]
J. Bohlmark et al., "The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge," Thin Solid Films, vol. 515, no. 4, s. 1522-1526, 2006.
[96]
J. T. Gudmundsson, J. Alami och U. Helmersson, "Spatial and Temporal Behavior of the Plasma Parameters in a Pulsed Magnetron Discharge," Surface & Coatings Technology, vol. 161, no. 2-3, s. 249-256, 2002.
[97]
J. T. Gudmundsson, J. Alami och U. Helmersson, "Evolution of the electron energy distribution and the plasma parameters in a pulsed magnetron discharge," Applied Physics Letters, vol. 78, no. 22, s. 3427-3429, 2001.
[98]
J. T. Gudmundsson, "On the effect of the electron energy distribution on the plasma parameters of argon discharge : A global (volume averaged) model study," Plasma sources science & technology, vol. 19, no. 1, s. 76-81, 2001.
[99]
J. T. Gudmundsson et al., "On the Plasma Parameters of a Planar Inductive Oxygen Discharge," Journal of Physics D : Applied Physics, vol. 33, s. 1323-1331, 2000.
[100]
J. T. Gudmundsson, "Ion Energy Distribution in H2/Ar Plasma in a Planar Inductive Discharge," Plasma sources science & technology, vol. 8, no. 1, s. 58-64, 1999.
[101]
J. T. Gudmundsson, H. G. Svavarsson och H. P. Gislason, "Lithium-gold-related complexes in p-type crystalline silicon," Physica B, vol. 273-274, s. 379-382, 1999.
[102]
J. T. Gudmundsson, "The Ion Energy Distribution in a Planar Inductive Oxygen Discharge," Journal of Physics D : Applied Physics, vol. 32, no. 7, s. 798-803, 1999.
[103]
J. T. Gudmundsson, "Experimental Studies of H2/Ar Plasma in a Planar Inductive Discharge," Plasma sources science & technology, vol. 7, no. 3, s. 330-336, 1998.
Konferensbidrag
[104]
M. T. Sultan et al., "Photoluminescence study of Si1-xGex nanoparticles in various oxide matrices," i 2021 International Semiconductor Conference (Cas), 2021, s. 21-24.
[105]
M. T. Sultan et al., "Enhanced Photoconductivity of SIGE-Trilayer Stack by Retrenching Annealing Conditions," i 2018 International Semiconductor Conference (CAS), 2018, s. 61-64.
[106]
M. T. Sultan et al., "The Effect of H2/Ar Plasma Treatment over Photoconductivity of Sige Nanoparticles Sandwiched between Silicon Oxide Matrix," i Proceedings of the International Semiconductor Conference, CAS, 2018, s. 257-260.
[107]
A. Slav et al., "Influence of preparation conditions on structure and photosensing properties of GeSi/TiO2 multilayers," i 2017 International Semiconductor Conference (CAS), 2017, s. 63-66.
[108]
J. T. Gudmundsson och H. Hannesdottir, "On the role of metastable states in low pressure oxygen discharges," i AIP Conference Proceedings, 2017.
[109]
J. T. Gudmundsson et al., "The current waveform in reactive high power impulse magnetron sputtering," i 2016 IEEE International Conference on Plasma Science (ICOPS), 2016.
[110]
J. T. Gudmundsson och H. Hannesdottir, "The role of the singlet metastables in capacitively coupled oxygen discharges," i 2016 IEEE International Conference on Plasma Science (ICOPS), 2016.
[111]
D. O. Thorsteinsson, T. K. Tryggvason och J. T. Gudmundsson, "Morphology of tantalum nitride thin films grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS)," i Materials Research Society Symposium Proceedings, 2015, s. 21-26.
[112]
J. S. Agustsson et al., "Electrical resistivity and morphology of ultra thin Pt films grown by dc magnetron sputtering on SiO(2)," i Journal of Physics Conference Series, 2008.
[113]
J. T. Gudmundsson et al., "Plasma Dynamics in an Unipolar Pulsed Magnetron Sputtering Discharge," i 57th Gaseous Electronics Conference, September 26-29, 2004, Shannon, The Republic of Ireland, 2004.
[114]
K. B. Gylfason et al., "Ultra-thin Lattice Matched Cr_xMo_1-x/MgO Multilayers," i 51st International Symposium of the American Vacuum Society, Anaheim , CA , USA, 2004., 2004.
Kapitel i böcker
[115]
D. Lundin, T. Minea och J. T. Gudmundsson, "Preface," i High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications, Daniel Lundin, Tiberiu Minea and Jon Tomas Gudmundsson red., : Elsevier, 2019, s. xiii-xiv.
Icke refereegranskade
Konferensbidrag
[116]
J. S. Agustsson et al., "Hydrogen uptake in MgO thin films grown by reactive magnetron sputtering," i 53rd International Symposium of the American Vacuum Society, November 12-17, San Francisco, CA, USA, 2006, 2006.
[117]
J. S. Agustsson et al., "Electrical properties of thin MgO films," i Thirteenth International Congress on Thin Films (ICTF-13), Stockholm, Sweden, 2005., 2005.
Böcker
[118]
D. Lundin, J. T. Gudmundsson och T. Minea, High power impulse magnetron sputtering : Fundamentals, technologies, challenges and applications. Elsevier, 2019.
Kapitel i böcker
[119]
M. Čada, J. T. Gudmundsson och D. Lundin, "Electron dynamics in high power impulse magnetron sputtering discharges," i High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications, : Elsevier, 2019, s. 81-110.
[120]
Z. Hubička et al., "Hardware and power management for high power impulse magnetron sputtering," i High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications, : Elsevier, 2019, s. 49-80.
[121]
M. Čada et al., "Heavy species dynamics in high power impulse magnetron sputtering discharges," i High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications, : Elsevier, 2019, s. 111-158.
[122]
J. T. Gudmundsson och D. Lundin, "Introduction to magnetron sputtering," i High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications, : Elsevier, 2019, s. 1-48.
[123]
T. Minea et al., "Modeling the high power impulse magnetron sputtering discharge," i High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications, : Elsevier, 2019, s. 159-221.
[124]
D. Lundin et al., "Physics of high power impulse magnetron sputtering discharges," i High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications, : Elsevier, 2019, s. 265-332.
[125]
T. Kubart, J. T. Gudmundsson och D. Lundin, "Reactive high power impulse magnetron sputtering," i High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications, : Elsevier, 2019, s. 223-263.
[126]
J. T. Gudmundsson et al., "ON ELECTRON HEATING IN MAGNETRON SPUTTERING DISCHARGES," i 2017 IEEE International Conference on Plasma Science (ICOPS), : IEEE, 2017.
Senaste synkning med DiVA:
2024-04-15 00:22:13